directed self assembly of block co polymers for nano manufacturing

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Directed Self assembly of Block Co polymers for Nano manufacturing
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Publisher : Woodhead Publishing
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ISBN 10 : 0081002610
Pages : 328 pages
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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

Directed Self assembly of Block Co polymers for Nano manufacturing

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the

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Self assembly of Block Copolymers for Nanopatterning

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Self-assembly of block copolymers (BCPs) is emerging as a promising route for numerous technological applications to fabricate a variety of nanoscopic structures. The resulting feature sizes range from a few to several hundred nanometers, and are readily tunable by varying the molecular weights of block copolymers. Directed self-assembly of block

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Principles of Lithography

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has

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Directed Self assembly for Nanofabrication and Device Integration

For more than 50 years, the size of the semiconductor devices has been scaling by approximately a factor of two every 1.5-2 years. This has brought tremendous benefits for the industry including lower cost per transistor, more computing power and higher speed. However, it has been recently observed that the scaling

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Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings,

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Directed Self assembly of Block Copolymers and Ternary Block Copolymer homopolymer Blends on Chemically Patterned Surfaces Into Device oriented Geometries

Download or read online Directed Self assembly of Block Copolymers and Ternary Block Copolymer homopolymer Blends on Chemically Patterned Surfaces Into Device oriented Geometries written by Mark P. Stoykovich, published by Unknown which was released on 2007. Get Directed Self assembly of Block Copolymers and Ternary Block Copolymer homopolymer Blends on

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Synthesis and Applications of Copolymers

Understanding the reactivity of monomers is crucial in creating copolymers and determining the outcome of copolymerization. Covering the fundamental aspects of polymerization, Synthesis and Applications of Copolymers explores the reactivity of monomers and reaction conditions that ensure that the newly formed polymeric materials exhibit desired properties. Referencing a wide-range of

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Directed Self assembly of Block Copolymers with Functional Materials

Block copolymers (BCPs) are a class of soft materials consisting of two (or more) different chains joint together by covalent bond. This special chemical structure leads to microphase separation and consequently a variety of highly controllable self-assembly patterns. Directed self-assembly (DSA) of BCPs has therefore emerged as one of the

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Macromolecular self-assembly - driven by weak, non-covalent, intermolecular forces - is a common principle of structure formation in natural and synthetic organic materials. The variability in material arrangement on the nanometre length scale makes this an ideal way of matching the structure-function demands of photonic and optoelectronic devices. However, suitable

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Self assembly of Block Copolymers for the Fabrication of Functional Nanomaterials

This dissertation explores the use of block copolymers which can self-assemble into different morphologies as templates to fabricate nanostructured materials. The first section (Chapters 2-4) reports the formation of mesoporous silica films with spherical, cylindrical and bicontinuous pores up to 40 nm in diameter through replicating the morphologies of the solid

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